- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/80 - Etching
Patent holdings for IPC class G03F 1/80
Total number of patents in this class: 371
10-year publication summary
33
|
35
|
46
|
38
|
48
|
34
|
23
|
28
|
38
|
11
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Hoya Corporation | 2822 |
66 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
61 |
Shin-Etsu Chemical Co., Ltd. | 5132 |
34 |
Applied Materials, Inc. | 16587 |
26 |
Samsung Electronics Co., Ltd. | 131630 |
12 |
Lam Research Corporation | 4775 |
10 |
Agc, Inc. | 4029 |
9 |
Kioxia Corporation | 9847 |
8 |
Tokyo Electron Limited | 11599 |
7 |
ASML Netherlands B.V. | 6816 |
7 |
Exogenesis Corporation | 77 |
7 |
LG Chem, Ltd. | 17205 |
6 |
Toppan Photomask Co., Ltd. | 56 |
6 |
International Business Machines Corporation | 60644 |
5 |
Boe Technology Group Co., Ltd. | 35384 |
5 |
Samsung Display Co., Ltd. | 30585 |
4 |
SK Hynix Inc. | 11030 |
4 |
Dai Nippon Printing Co., Ltd. | 3891 |
4 |
S&S Tech Co., Ltd. | 26 |
4 |
FUJIFILM Corporation | 27102 |
3 |
Other owners | 83 |